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Lithography Engineer
Cornell NanoScale Facility
The Cornell NanoScale Science and Technology Facility (CNF) enables rapid advancements in science, engineering and technology at the nanoscale by providing efficient access to nanotechnology infrastructure and expertise. CNF operates as a flexible open user facility and is proud to be a member of the National Nanotechnology Coordinated Infrastructure (NNCI). CNF is a leading university nanotechnology facility with extensive resources, supporting a broad base of users from Cornell, other universities, and companies across the United States. Serving the national user community for 45 years, CNF features the most advanced lithography capabilities of any university laboratory, with two JEOL ebeam lithography systems, three steppers (DUV, i-line, g-line), contact lithography, mask making, 2 photon lithography, and all associated support equipment. Key to our continued success are our 22 expert support staff who maintain the technology resource, train 100s of new users per year, and provide technical support to our over 500 users per year.
CNF has one or more openings for an advanced lithography engineer to join our user support team. Responsibilities include:
Maintain and/or direct external maintenance of a subset of CNF lithography tools (ASML DUV stepper, GCA i-line and g-line steppers, contact lithography, mask making ,2 photon printing, electron beam lithography)
Develop, characterize, troubleshoot, and maintain advanced lithography processes
Prepare training materials and train users at all levels in correct operation of these advanced tools
Support users in selection of appropriate lithography processes and integration with other thin film processes to achieve the user’s desired project goals.
Coordinate user/equipment support activities with other lithography and thin films staff
This is a hands-on process, equipment, and user support position. At least 20 hours per week will be spent in the cleanroom, with regular handling of hazardous chemicals. The successful candidate will have experience working in a multi-user fabrication facility with experience interacting with users and trainees at a broad range of levels. The successful candidate will have extensive experience not only with photo or ebeam lithography, but with associated process integration with other thin film technologies available in the facility.
Qualifications and Education Requirements
B.S./M.S. in any branch of physical science/engineering with 3- 5 years relevant experience in the areas described required (see below). Good communication skills, time management skills, and a good customer service demeanor are required. Ability to work with hazardous chemicals. High degree of interpersonal and organizational skills. Must be adaptable to changing priorities, situations and demands. Ability to work in cleanroom environment. Ability to work independently and cooperatively without direct supervision. Collaborative approach to problem solving when required. Basic office and technical computer skills.
The listed position is for an advanced lithography engineer with a high level of experience and broad technology expertise in nanotechnology support. We encourage applications, however, from candidates at all levels with interest/experience in photolithography, electron beam lithography, electron microscopy, and thin film processing. Candidates with more limited experience or narrower expertise will be considered for appointment at other levels for related positions. Applicants with a Ph.D. should consider applying to a related posting at Cornell for (electron beam) Lithography Engineer at the Research Associate level, a (non-tenure track) research support academic staff appointment. Applicants should detail their specific relevant experience and interests in a cover letter and resume attached to the application. All applicants will be considered for all available positions.
Preferred Skills
Experience with advanced stepper-based photolithography, electron beam lithography, or advanced electron microscopy. Process control, experimental design, and process/equipment troubleshooting desirable. Advanced technical computer skills including Computer Aided Design, pattern generation/conversion, LINUX, scripting, etc. recommended.
Electronic and mechanical system troubleshooting, design or repair experience desirable. Experience supporting users in a multi-user facility desirable.
Applications will be reviewed as they are received.
Visa sponsorship not available for this position.
University Job Title:
Research Support Spec III
Job Family:
Academic Support
Level:
G
Pay Rate Type:
Salary
Company:
Contact Name:
Rebecca Vliet
Number of Openings:
3
Job Titles and Pay Ranges:
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Prior relevant work or industry experience.
Education level to the extent education is relevant to the position.
Unique applicable skills.
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2022-02-02-08:00