Publications
1. Onoprienko A.A., Ivashchenko V.I., Dub S.N., Khyzhun O.Yu., Timofeeva I.I. Microstructure and mechanical properties of hard Ti-Si-C-N films deposited by dc magnetron sputtering of multicomponent Ti/C/Si target. Surface and Coatings Technology (2011) Article in Press.
2. Onoprienko A.A., Yanchuk I.B., Kossko, I.A. Relationship between structure and electrical resistivity in nano-structured copper-containing carbon films. Surface and Coatings Technology 204 (24), (2010) 4091-4094.
3. Onoprienko A.A., Danilenko N.I. Thermal stability of nanosized composite C-Cu films. Powder Metallurgy and Metal Ceramics 49 (1-2) (2010) 50-54.
4. Onoprienko A.A., Danilenko N.I. Structural evolution on annealing of layered C-Cu composite films. Powder Metallurgy and Metal Ceramics 48 (1-2) (2009) 93-99.
5. Onoprienko A.A., Danilenko N.I., Kossko I.A., Gorban V.F. Microstructural study of composite C-Cu films deposited by dc magnetron sputtering. Surface and Coatings Technology 202 (9) (2008) 1728-1732.
6. Onoprienko A.A., Danilenko N.I., Kossko I.A. Structure evolution on annealing of copper-doped carbon film. Thin Solid Films 515 (17) (2007) 6672-6675
7. Onoprienko A.A. Electrical resistivity and real structure of magnetron-sputtered carbon films. Topics in Applied Physics 100 (2006) 175-186.
8. Onoprienko A.A., Artamonov V.V., Yanchuk I.B. Effect of magnetron discharge power on the resistivity and microstructure of carbon films. Surface and Coatings Technology 200 (14-15) (2006) 4174-4178.
9. Onoprienko A.A., Yanchuk I.B. Temperature dependence of the mechanical properties of amorphous carbon films deposited by magnetron sputtering. Powder Metallurgy and Metal Ceramics 45 (3-4) (2006) 190-195.
10. Onoprienko A.A., Yanchuk I.B. Structural studies of materials: Effects of deposition conditions on carbon-film resistivity and microstructure. Powder Metallurgy and Metal Ceramics 44 (9-10) (2005) 499-504.
11. Onoprienko A.A., Artamonov V.V., Yanchuk I.B. Effect of deposition and anneal temperature on the resistivity of magnetron sputtered carbon films. Surface and Coatings Technology 172 (2-3) (2003) 189-193.
12. Novoselova I.A., Fedorishena Y.N., Onoprienko A.A., Panov E.V. Electrochemical behavior of boron-containing amorphous-carbon films. Ukrainskij Khimicheskij Zhurnal 68 (9-10) (2002) 32-36.
13. Shaginyan, L.R., Onoprienko, A.A., Britun, V.F., Smirnov, V.P. Microstructure and properties of a-C films deposited under ion bombardment conditions. Powder Metallurgy and Metal Ceramics 40 (5-6) (2001) 292-296.
14. Shaginyan L.R, Onoprienko A.A, Britun V.F, Smirnov V.P. Influence of different physical factors on microstructure and properties of magnetron sputtered amorphous carbon films. Thin Solid Films 397 (1-2) (2001) 288-295.
15. Jastrabik L., Soukup L., Shaginyan L.R., Onoprienko A.A. Deposition conditions and composition and structure relationships for nitride carbon films obtained by ECR plasma-assisted CVD and reactive rf magnetron sputtering. Surface and Coatings Technology 123 (2-3) (2000) 261-267.
16. Shaginyan L.R., Onoprienko A.A., Vereschaka V.M., Fendrych F., Vysotsky V.G. Role of ion bombardment in forming CNx and CNxHy films deposited by r.f.-magnetron reactive sputtering and ECR plasma-activated CVD methods. Surface and Coatings Technology 113 (1-2) (1999) 134-139.
17. Vereshchaka V.M., Onoprienko A.A., Shaginyan L.P. Analysis of the composition of Sr-Bi-Ca-Cu-Pb-O films obtained by magnetron sputtering. Powder Metallurgy and Metal Ceramics 35 (4-6) (1996) 241-243.
18. Onoprienko A.A., Shaginyan L.R. Role of microstructure in forming thin carbon film properties. Diamond and Related Materials 3 (8) (1994) 1132-1136.
