Publications
1. T. C. Tien, F. M. Pan, L. P. Wang, F. Y. Tsai, C. Lin, Coverage analysis for the core/shell electrode of dye-sensitized solar cells, J. Phys. Chem. C, 114, 10048 (2010).
2. T. C. Tien, L. C. Lin, L. S. Lee, C. J. Hwang, S. Maikap, Y. Shulga, Analysis of weakly bonded oxygen in HfO2/SiO2/Si stacks by using HRBS and ARXPS, J. Mater. Sci.: Mater. Electron., 21, 475 (2010).
3. A. Das, S. Maikap, C. H. Lin, P. J. Tzeng, T. C. Tien, T. Y. Wang, L. B. Chang, J. R. Yang, M. J. Tsai, Ruthenium oxide metal nanocrystal capacitors with high-k dielectric tunneling barriers for nanoscale nonvolatile memory device applications, Microelectronic Engineering, 87, 1821 (2010).
4. T. C. Tien, F. M. Pan, L. P. Wang, C. H. Lee, Y. L. Tung, S. Y. Tsai, C. Lin, F. Y. Tsai, S. J. Chen, Interfacial energy levels and related properties of atomic-layer-deposited Al2O3 films on nanoporous TiO2 electrodes of dye-sensitized solar cells, Nanotechnology, 20, 305201 (2009).
5. C. P. Chen, T. C. Tien, B. T. Ko, Y. D. Chen, C. Ting, Energy level alignment at the anode of poly(3-hexylthiophene)/fullerene-based solar cells, ACS Appl. Mater. Interfaces, 1(4). 741 (2009).
6. T. M. Chen, J. Y. Hung, F. M. Pan, L. Chang, S. C. Wu, T. C. Tien, Pulse electrodeposition of iridium oxide on silicon nanotips for field emission study, J. Nanosci. Nanotech., 9(5), 3264 (2009).
7. C. Lin, F. Y. Tsai, M. H. Lee, C. H. Lee, T. C. Tien, L. P. Wang, S. Y. Tsai, Enhanced performance of dye-sensitized solar cells by an Al2O3 charge-recombination barrier formed by low-temperature atomic layer deposition, J. Mater. Chem., 19, 2999 (2009).
8. S. Maikap, A. Das, T. Y. Wang, T. C. Tien, L. B. Chang, High-k HfO2 Nanocrystal Memory Capacitors Prepared by Phase Separation of Atomic-Layer-Deposited HfO2/Al2O3 Nanomixtures, J. Electrochem. Soc., 156, 3, K28 (2009).
9. S. Maikap, S. Z. Rahaman, T. C. Tien, Nanoscale nonvolatile memory characteristics using n-Si/SiO2/HfAlO nanocrystal/Al2O3/Pt capacitors, Nanotechnology, 19, 435202 (2008).
10. Y. M. Shulga, T. C. Tien, C. C. Huang, S. C. Lo, V. E. Muradyan, N. F. Polyakova, Y. C. Ling, R. O.Loutfy, A. P. Moravsky, XPS study of fluorinated carbon multi-walled nanotubes, J. Electron Spectroscopy, 160, 22 (2007).
11. S. Maikap, T. Y. Wang, P. J. Tzeng, T. C. Tien, L. S. Lee, J. R. Yang, M. J. Tsai, Band offsets and charge storage characteristics of atomic layer deposited high-k HfO2/TiO2 multilayers, Appl. Phys. Lett., 90, 262901 (2007).
12. S. Maikap, P. J. Tzeng, H. Y. Lee, C. C. Wang, T. C. Tien, L. S. Lee, M. J. Tsai, Physical and electrical characteristics of atomic layer deposited TiN nanocrystal memory capacitors, Appl. Phys. Lett., 91, 043114 (2007).
13. W. H. Tuan, T. C. Tien, Effect of addition of a small amount of silver on the microstructure and mechanical properties of YBa2Cu2O7−x, Mater. Chem. Phys, 39, 72 (1994).
14. W. H. Tuan, T. C. Tien, Mechanical performance of YBa2Cu3O7−x-Ag composites, J. Mater. Sci. Lett., 13, 1019 (1994).
